Intevac EBITDA 2010-2024 | IVAC
Intevac ebitda from 2010 to 2024. Ebitda can be defined as earnings before interest, taxes, depreciation and amortization.
Intevac Annual EBITDA
(Millions of US $) |
| 2023 |
$-13 |
| 2022 |
$-16 |
| 2021 |
$-19 |
| 2020 |
$-6 |
| 2019 |
$7 |
| 2018 |
$0 |
| 2017 |
$9 |
| 2016 |
$-3 |
| 2015 |
$-4 |
| 2014 |
$-14 |
| 2013 |
$-12 |
| 2012 |
$-18 |
| 2011 |
$-24 |
| 2010 |
$37 |
| 2009 |
$-12 |
Intevac Quarterly EBITDA
(Millions of US $) |
| 2024-03-31 |
$-4 |
| 2023-12-31 |
$-2 |
| 2023-09-30 |
$-1 |
| 2023-06-30 |
$-5 |
| 2023-03-31 |
$-4 |
| 2022-12-31 |
$-3 |
| 2022-09-30 |
$-3 |
| 2022-06-30 |
$-2 |
| 2022-03-31 |
$-7 |
| 2021-12-31 |
$-6 |
| 2021-09-30 |
$-3 |
| 2021-06-30 |
$-6 |
| 2021-03-31 |
$-5 |
| 2020-12-31 |
$-9 |
| 2020-09-30 |
$1 |
| 2020-06-30 |
$3 |
| 2020-03-31 |
$-0 |
| 2019-12-31 |
$8 |
| 2019-09-30 |
$0 |
| 2019-06-30 |
$-0 |
| 2019-03-31 |
$-1 |
| 2018-12-31 |
$3 |
| 2018-09-30 |
$-0 |
| 2018-06-30 |
$2 |
| 2018-03-31 |
$-4 |
| 2017-12-31 |
$1 |
| 2017-09-30 |
$2 |
| 2017-06-30 |
$2 |
| 2017-03-31 |
$3 |
| 2016-12-31 |
$4 |
| 2016-09-30 |
$1 |
| 2016-06-30 |
$-2 |
| 2016-03-31 |
$-5 |
| 2015-12-31 |
$-1 |
| 2015-09-30 |
$-3 |
| 2015-06-30 |
$2 |
| 2015-03-31 |
$-2 |
| 2014-12-31 |
$-4 |
| 2014-09-30 |
$-3 |
| 2014-06-30 |
$-4 |
| 2014-03-31 |
$-3 |
| 2013-12-31 |
$3 |
| 2013-09-30 |
$-2 |
| 2013-06-30 |
$-6 |
| 2013-03-31 |
$-8 |
| 2012-12-31 |
$-4 |
| 2012-09-30 |
$-10 |
| 2012-06-30 |
$1 |
| 2012-03-31 |
$-5 |
| 2011-12-31 |
$-7 |
| 2011-09-30 |
$-6 |
| 2011-06-30 |
$-3 |
| 2011-03-31 |
$-8 |
| 2010-12-31 |
$1 |
| 2010-09-30 |
$17 |
| 2010-06-30 |
$16 |
| 2010-03-31 |
$3 |
| 2009-12-31 |
$6 |
| 2009-09-30 |
$-2 |
| 2009-06-30 |
$-7 |
| 2009-03-31 |
$-8 |
| Sector |
Industry |
Market Cap |
Revenue |
| Computer and Technology |
Electronics - Manufacturing Machinery |
$0.113B |
$0.053B |
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Intevac, Inc. is a leading supplier of static sputtering systems and related manufacturing equipment used to manufacture thin-film disks for computer hard disk drives. Sputtering is a complex vacuum deposition process used to deposit multiple thin-film layers on a disk. Thecompany's primary objective is to be the industry leader in supplying disksputtering equipment by providing disk sputtering systems which have both the highest overall performance and the lowest cost of ownership in the industry.
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